The Takeda Award 理事長メッセージ 受賞者 選考理由書 授賞式 武田賞フォーラム
2002

選考理由書
情報・電子系応用分野

選考理由
業績とその創造性
1. 情報化社会における発光半導体デバイスの役割
2. 発光半導体デバイス
3.
4. 中村による窒化ガリウム青色発光半導体デバイス開発
5. 波及効果
6. 結論
参考文献
図1
図2

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▼情報・電子系応用分野 ▼生命系応用分野 ▼環境系応用分野
業績とその創造性
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参考文献

1) Ohki, Y., Toyoda, Y., Kobayasi, H., and Akasaki, I. "Fabrication and properties of a practical blue-emitting GaN" Inst. Phys. Conf. Ser. 63, 479(1981).
2) Amano, H., Sawaki, N., Akasaki, I., and Toyoda, Y. "Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer" Appl. Phys. Lett. 48,353(1986).
3) Akasaki, I., Amano, H., Koide, Y., Hiramatsu, K., Sawaki, N.,"Effects of AlN buffer layer on crystallographic structure and on electrical and optical properties of GaN and Ga1-xAlxN (0<x≦0.4) films grown on sapphire substrate by MOVPE", J. Crystal Growth 98, 209(1989).
4) Amano, H. and Akasaki, I., "Fabrication and properties of GaN p-n junction LED", Mat. Res. Soc. Extended Abstract (EA-21) 165(1990).
5) Amano, H., Akasaki, I., Kozawa, T., Hiramatsu, K., Sawaki, N., Ikeda, K., and Ishii, Y. "Electron Beam Effects on Blue Luminescence of Zinc-Doped GaN" J. Lumin. 40&41,121(1988).
6) Amano, H., Kito, M., Hiramatsu, K., and Akasaki, I. "P-Type conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation(LEEBI)" Jpn. J. Appl. Phys. 28,L2112(1989).
7) Amano, H., Asahi, T., and Akasaki, I. "Stimulate Emission Near Ultraviolet at Room Temperature from a GaN Film Grown on Sapphire by MOVPE Using an AlN Buffer Layer" Jpn. J. Appl. Phys. 29,L205(1990).
8) Akasaki, I., Amano, H., Sota, S., Sakai, H., Tanaka, T., and Koike, M. "Stimulated Emission by Current Injection from an AlGaN/GaN/GaInN Quantum Well Device" Jpn. J. Appl. Phys. 34,L1517(1995).
9) Akasaki, I., Sota, S., Sakai, H., Tanaka, T., Koike, M., and Amano, H. "Shortest wavelength semiconductor laser diode"Electron. Lett. 32,1105(1996).
10) Nakamura, S. et al. "Novel metalorganic chemical vapor deposition system for GaN growth" Appl. Phys. Lett. 58,2021(1991).
11) Nakamura, S. And Mukai, T. "High-Quality InGaN Films Grown on GaN Films" Jpn. J. Appl. Phys. 31,L1457(1992)
12) Nakamura, S. "GaN Growth Using Buffer Layer" Jpn. J. Appl. Phys. 30,L1705(1991).
13) Nakamura, S. et al. "Thermal Annealing Effects on P-Type Mg-Doped GaN Films" Jpn. J. Appl. Phys. 31,L139(1992).
14) Nakamura, S. et al. "Hole Compensation Mechanism of p-type GaN Films" Jpn. J. Appl. Phys. 31,1258(1992).
15) Nakamura, S. et al. "Candela-Class High-Brightness InGaN/AlGaN Double-Hetrostructure Blue-Light-Emitting Diodes" Appl. Phys. Lett. 64,1687(1994).
16) Nakamura, S. et al. "High-power InGaN single-quantum-well-structure blue and violet light-emitting diodes" Appl. Phys. Lett 67,1868(1995).
17) Nakamura, S. et al. "InGaN-Based Multi-Quantum-Well-Structure Laser Diodes" Jpn. J. Appl. Phys. 35,L74(1996).
18) Nakamura, S. et al. "Room-temperature continuou-wave operation of InGaN multi-quantum-well structure laser diodes" Appl. Phys. Lett. 69,4056(1996).
19) Usui, A. et al. "Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase Epitaxy" Jpn. J. Appl. Phys. 36,L899(1997).
20) Nakamura, S. "Current Status and Future Prospects of InGaN-Based Laser Diodes" JSAP International 1,5(2000).
21) http://www.energy.ca.gov/releases/2002_releases/2002-03-14_led_signals.html
朝日新聞 2002年7月8日記事
22) 田口常正 "白色LEDと照明システム" O plus E p10,Aug.(2000).
23) http://www.compoundsemiconductor.net/magazine/article/8/4/6/2
24) http://e-solution.nkk.co.jp/kankyo-q/q1-5.html
http://it.nikkei.co.jp/it/archive/chokoku/2001032505715p8.cfm
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